![]() 1500XC High Vacuum 3 Zone Tube Furnace |
![]() 1700XC Low Vacuum Single Zone Tube Furnace |
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![]() Photolithography System in Clean Room, Class 100 |
![]() ULVAC Multi-chambers Deposition System in Clean Room, Class 1,000 |
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![]() ASTEX ECR Microwave Plasma CVD Chambers 1.5kW |
![]() ASTEX ECR Microwave Plasma CVD Chambers 5kW |
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![]() 1700XC Low Vacuum Single Zone Tube Furnace |
![]() Dual Ion Beam Deposition |
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![]() UHV Thermal Evaporation System 1 |
![]() Hot Filament CVD System |
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![]() UHV Magnetron Sputtering System |
![]() UHV Magnetron Sputtering System |
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![]() Multi-Source Thermal Deposition System |
![]() RF Plasma-assisted hot filament CVD System |
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![]() UHV Thermal Evaporation System 2 |
![]() UHV Thermal Evaporation System 3 |
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![]() UHV Electron Beam Deposition System |
![]() Philips FEG TEM CM200 |
![]() Nano Indenter XP |
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![]() Omicron (Low Temp.) UHV Multiprobe XP, SPM |
![]() Philips FEG SEM XL30 |
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![]() Photoluminescence Spectroscopy |
![]() Reishaw Raman Spectroscopy 2000 |
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![]() Time Resolve Photoluminescent Spectroscopy |
![]() VG ESCALAB 220i-XL |