Facilities

DC Sputter deposition is one of a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source deposite onto a "substrate". The sputtering targets come in a wide variety of materials, including ceramic insulators, metal oxides, pure metals and alloys.

Philips X’Pert X-ray diffractometer (XRD) is a versatile device to characterise crystalline materials. It is capable of performing various types of measurements and analyses. It is mainly used for general diffraction work and phase analysis. In addition, it can determine the stresses in (sub) surface layers and line profile analysis. All measurements are done at room temperature.

SAXS system is used for characterizing nanostructured materials and samples. It determines the size, size distribution and shape of nano-sized particles and sample domains and is especially suited for analyzing isotropic and colloidal.

The Time Resolved Fluorescence combines ultimate sensitivity with high spectral resolution and excellent stray light rejection, the wide wavelength range of 200 to 1650 nm enables steady state and time-resolved measurement over the ultraviolet, visible, and near-infrared regions.

The DMA is a new dimension for testing of solid and soft-solid materials. The most sensitive and accurate rotational shear measurements, the Discovery Hybrid Rheometer can deliver accurate linear DMA data. The DMA capability is available in: film tension, threepoint bend, cantilever, compression, etc.

JSM-IT500 is a new model of JEOL InTouchScope series. Equipped with sophisticated Analytical series, the embedded  Energy Dispersive X-Ray Spectroscopy (EDS) system shows a real time EDS spectrum during image observation.

Energy-dispersive X-ray fluorescence (XRF) offers all you need to measure and monitor elements in your samples, independent of the industry or environment in which you are working. The outstanding strength of XRF is the wide range of elements, from light elements like Sodium (Na), to heavy elements like Americium (Am).

Cryogenic equipment capable of electrical, optical and several other measurements at temperatures down to 0.01 Kelvin and magnetic field of up to 12 Tesla.

This state-of-the-art high-vacuum laser molecular beam epitaxy (L-MBE) system equipped with reflection high-energy electron diffraction (RHEED), an apparatus for in-situ monitoring thin-film growth, enables atomic-precision fabrication of low-dimensional quantum materials. Being a key part, a powerful Coherent 205F excimer KrF laser is bundled to the system as the target-bombardment energy source for materials synthesis. With oxygen (among other supplied gases) environment, the system can grow a wide range of oxide materials in thin-film form, ideal for fundamental research and device applications. A connected E-beam evaporator allows various electrode and dielectric materials to be deposited onto film surfaces without contacting air, facilitating fabrication of high-quality metal-thin film interfaces.

The University’s centralized High-Performance Computing (HPC) cluster is under the Computing Services Centre's (CSC) management. The HPC is available for researchers to conduct computing intensive research projects in areas such as biomolecular simulation, artificial intelligence, machine learning, statistical analysis of large data sets, etc.