MSE6121 - Thin Film Technology and Nanocrystalline Coatings | ||||||||||||
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| * The offering term is subject to change without prior notice | ||||||||||||
Course Aims | ||||||||||||
The course provides fundamental knowledge on modern technologies for thin films and nanomaterials synthesis, and it equips the students with knowledge in processing both pure elementary materials and compounds that can be prepared in crystalline, polycrystalline, nanocrystalline or amorphous forms. Various growth techniques, such as thermal evaporation including resistance evaporation, electron beam evaporation, molecular beam epitaxy, atomic layer deposition and laser ablation and their working principles and characteristics are discussed in details. The practical applications of these techniques are demonstrated. The course is designed as a practical guide in thin film deposition used in industry and science. The working principles of plasma technologies used for thin film deposition will also be introduced and explained in details, such as plasma deposition using electrical discharge, application of cold plasma to thin film deposition, plasma enhanced chemical vapor deposition, surface modification by cold plasma, cathodic vacuum arc and ion beam processes. It also stimulates ingenuity in experiment and material processing design as well as inventiveness in designing of novel materials and nanomaterials. The course represents an important interface between the school and industrial and scientific practice. | ||||||||||||
Assessment (Indicative only, please check the detailed course information) | ||||||||||||
Continuous Assessment: 30% | ||||||||||||
Examination: 70% | ||||||||||||
Examination Duration: 2 hours | ||||||||||||
Detailed Course Information | ||||||||||||
| MSE6121.pdf | ||||||||||||
Useful Links | ||||||||||||
| Department of Materials Science and Engineering | ||||||||||||
